A SEM review station provides a plurality of images of a defect area of a wafer structure, particularly a semiconductor integrated circuit, during manufacture. Inspection of the multiple images provides a depth determination and/or contour information. Knowing the depth of a defect is useful for determining...http://www.google.com.hk/patents/US6353222?utm_source=gb-gplus-share專利 US6353222 - Determining defect depth and contour information in wafer structures using multiple SEM images
