A CDV method in which a substrate having a surface to be deposited where the film is placed in a reaction chamber and a reactive gas introduced into the reaction chamber is excited by irradiation with flat light and scattered light to thereby deposit the film on the substate surface. The flat light is...http://www.google.com.hk/patents/US4719122?utm_source=gb-gplus-share專利 US4719122 - CVD method and apparatus for forming a film
