Methods of manufacturing an integrated circuit by a lithographic apparatus are disclosed. The methods include patterning a radiation beam with a patterning device, projecting the patterned beam onto a substrate using a projection system, and determining the position of the patterning device. In one example,...http://www.google.com.hk/patents/US7804584?utm_source=gb-gplus-share專利 US7804584 - Integrated circuit manufacturing methods with patterning device position determination
