A heater is used in a CVD apparatus. In the CVD apparatus, reactive gas is supplied through a reactive gas supply plate to a substrate on a substrate holder to deposit a film on the substrate, and a purge gas supply passage is formed by placing a shield mechanism around the substrate holder, the shield...http://www.google.com.hk/patents/US5766363?utm_source=gb-gplus-share專利 US5766363 - Heater for CVD apparatus
