A method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected by scanning its complete surface at a relatively high speed and with an optical beam of relatively...http://www.google.com.hk/patents/US5699447?utm_source=gb-gplus-share專利 US5699447 - Two-phase optical inspection method and apparatus for defect detection
