A method of depositing a low carbon content, high density TiN thin film on a substrate. A substrate is placed within a deposition chamber, and the pressure within the deposition chamber is adjusted to the deposition pressure. A portion of the total thickness desired of the TiN thin film is deposited....http://www.google.com.hk/patents/US5956613?utm_source=gb-gplus-share專利 US5956613 - Method for improvement of TiN CVD film quality
