Electronic devices are constructed by a method that includes forming a first conductive layer in an opening in a multilayer dielectric structure supported by a substrate, forming a core conductive layer on the first conductive layer, subjecting the core conductive layer to a H2 plasma treatment, and...http://www.google.com.hk/patents/US7220665?utm_source=gb-gplus-share專利 US7220665 - H2 plasma treatment
