The present invention is a system and method to create two dimensional and three dimensional structures using a maskless photolithography system that is semi-automated, directly reconfigurable, and does not require masks, templates or stencils to create each of the planes or layers on a multi layer two-dimensional...http://www.google.com.hk/patents/US6544698?utm_source=gb-gplus-share專利 US6544698 - Maskless 2-D and 3-D pattern generation photolithography
